Electrooptical device substrate, electrooptical device, methods for fabricating electrooptical device substrate and electrooptical device, electronic apparatus, and method for tuning color of color filter

ABSTRACT

A substrate  201  has a reflective layer  211  thereon having apertures  211   a , and the reflective layer has a color filter  212  thereon having coloring layers  212   r   , 212   g   , 212   b . One coloring layer at each pixel has a hyperchromic portion  212   c  above the corresponding aperture  211   a  of the reflective layer  211,  and a hypochromic portion  212   d  on the reflective layer  211.  There is a region in which no hyperchromic portion  212   c  is disposed above the corresponding aperture  211   a  (FIG.  1 (A)) or another region in which no hypochromic portion 212 d  is disposed on the reflective layer  211  (FIG.  1 (B)).

BACKGROUND OF THE INVENTION

[0001] 1. Technical Field of the Invention

[0002] The present invention relates to electrooptical devicesubstrates, electrooptical devices, methods for fabricating theelectrooptical device substrates and the electrooptical devices, andmethods for tuning the colors of color filters, and more particularly,the present invention relates to a structure of a color filter suitablefor a transflective electrooptical device.

[0003] 2. Description of the Related Art

[0004] Hitherto, in known transflective liquid crystal display panels,both a reflective display using external light and a transmissivedisplay using illuminating light such as backlight are made visible. Alltransflective liquid crystal display panels have a reflective layertherein for reflecting external light and have a structure in whichilluminating light such as light from a backlight passes through thereflective layer. Some reflective layers of this type have a pattern inwhich one aperture (one slit), having a predetermined ratio, is providedat each pixel of the liquid crystal display panel.

[0005]FIG. 11 is a schematic sectional view illustrating the schematicstructure of a known transflective liquid crystal display panel 100. Theliquid crystal display panel 100 has a structure in which a substrate101 and a substrate 102 are bonded to each other with sealing adhesive103 and liquid crystal 104 is injected between the substrates 101 and102.

[0006] The substrate 101 has a reflective layer 111, having one aperture111 a at each pixel, formed on the inner surface thereof, and thereflective layer 111 has a color filter 112, having coloring layers 112r, 112 g, and 112 b and an overcoat film 112 p, formed thereon. Theovercoat film 112 p on the color filter 112 has transparent electrodes113 formed on the surface thereof.

[0007] On the other hand, the substrate 102 has transparent electrodes121 formed on the inner surface thereof so as to be orthogonal with thetransparent electrodes 113 on the substrate 101 which faces thesubstrate 102. The transparent electrodes 113 above the substrate 101and transparent electrodes 121 above the substrate 102 have an alignmentfilm and a hard transparent film formed thereon, as required.

[0008] Also, the substrate 102 has a retardation film (¼-wave film) 105and a polarizer 106 sequentially disposed on the outer surface thereof,and the substrate 101 has a retardation film (¼-wave film) 107 and apolarizer 108 sequentially disposed on the outer surface thereof.

[0009] When the liquid crystal display panel 100 having the structure asdescribed above is installed in an electronic apparatus such a portablephone or a portable information terminal, the electronic apparatus has abacklight 109 behind the liquid crystal display panel 100. In the liquidcrystal display panel 100, during the daytime or in a well-lit place,e.g., in a building, the reflective display is visible since externallight is reflected off the reflective layer 111 after passing throughthe liquid crystal 104, again passes through the liquid crystal 104, andis emitted from the liquid crystal display panel 100 along a reflectingpath R. On the other hand, at night-time or in a dark area, e.g., in theopen air, by illuminating the backlight 109, the transmissive display isvisible since, after passing through the apertures 11 a, a part of theilluminating light from the backlight 109 passes through the liquidcrystal display panel 100 and is then emitted from the liquid crystalpanel 100 along a transmitting path T.

[0010] However, when the color of the liquid crystal display is to betuned in the foregoing known liquid crystal panel, it is required toprepare photosensitive agents in which the amounts of colorants such aspigments are finely adjusted in order to achieve the desired displaycolor, thereby increasing the material cost and requiring a lot of workfor preparing the photosensitive agents. In particular, in the foregoingtransflective liquid crystal display panel, since the colors of thetransmissive display and the reflective display are different from eachother, optimizing the colors of the transmissive display and thereflective display at the same time is impossible. Accordingly, thedisplay colors are set in a moderately compromised manner, therebygiving rise to problems in that improving the display quality of theliquid crystal display panel is difficult and that the foregoing tuningwork of the color becomes troublesome burden when the liquid crystaldisplay panel is fabricated.

[0011] Also, since light traveling along the transmitting path T passesthrough the color filter 112 only once while light traveling along thereflecting path R passes through the color filter 112 twice, that is, inboth directions, the chroma of the transmissive display is inferior tothat of the reflective display. More particularly, since the brightnessof the reflective display generally tends to be insufficient, it isnecessary to set the color filter 112 so as to have a high lighttransmission in order to maintain the brightness thereof; however, thisarrangement causes the transmissive display to have an insufficientchroma. Moreover, as described above, the number of times the lightpasses through the color filter in the reflective display is differentfrom that in the transmissive display, and thus the perceived color ofthe reflective display is dramatically different from that oftransmissive display, thereby detracting from the appearance.

[0012] Accordingly, the present invention is made so as to solve theforegoing problems. An object of the present invention is to provide amethod and a structure in which the color of the color filter can beeasily and finely tuned at low cost. Another object of the presentinvention is to provide an electrooptical device substrate and atransflective electrooptical device which can maintain sufficientbrightness of the reflective display and sufficient chroma of thetransmissive display at the same time when a display device capable ofperforming reflective display and transmissive display at the same timeis used. Still another object of the present invention is to achieve adisplay technology which can reduce the difference in the perceivedcolor between the reflective display and the transmissive display.

SUMMARY OF THE INVENTION

[0013] In order to solve the foregoing problems, in an electroopticaldevice substrate and an electrooptical device, and by methods forfabricating them according to the present invention, coloring layers,each having a hypochromic portion and a hyperchromic portion having ahigher light density than the hypochromic portion, and a reflectivelayer including apertures are formed, wherein the hypochromic portion isdisposed so as to two-dimensionally overlap the reflective layer and thehyperchromic portion is disposed so as to two-dimensionally overlap thecorresponding aperture. With this structure, in the coloring layerhaving the hypochromic portion and the hyperchromic portion, since thehyperchromic portion is disposed at least above the correspondingaperture of the reflective layer, light passing through thecorresponding aperture of the reflective layer is transmitted throughthe hyperchromic portion. Accordingly the chroma of transmitted lightcan be improved compared to what is possible today, and also thedifferences in the degrees of both the chroma and the hue between areflective display and a transmissive display can be reduced.

[0014] Now, light density means the capabilities per unit thickness ofthe colored layer for causing deviation of the wavelength distributionof light, wherein, in the event that the light density is high (great)the color (colorfulness) of the transmitted light is intense, and n theevent that the light density is low (small), the color of thetransmitted light is weak. In the event that the colored layer containscoloring material such as pigment or dye of the like, this light densitynormally has a positive correlation with the amount of the coloringmaterial.

[0015] In an electrooptical device substrate according to the presentinvention, for forming coloring layers thereon, each comprising ahypochromic portion and a hyperchromic portion having a higher lightdensity than the hypochromic portion, and for forming a reflectivelayer, including apertures, thereon, the hypochromic portion is disposedon the reflective layer, the hyperchromic portion is disposed above thecorresponding aperture, and there is a region in which no hyperchromicportion is disposed above a part of the corresponding aperture.

[0016] In the electrooptical device substrate according to the presentinvention, since there is a region in which no hyperchromic portion isdisposed above a part of the corresponding aperture of the reflectivelayer, the color of the transmissive display can be tuned in accordancewith the ratio of the area of the hyperchromic portion above thecorresponding aperture to that of the foregoing region, and thus thelevel of light modulation can be lowered in comparison to theconfiguration in which the hyperchromic portion is disposed so as tocover the corresponding whole aperture.

[0017] In the electrooptical device substrate according to the presentinvention, the hypochromic portion is preferably disposed in at leastone part of the region. With this configuration, since the level oflight modulation can be changed in accordance with the three areas ofthe hyperchromic portion above the corresponding aperture, thehypochromic portion above the corresponding aperture, and the region inwhich no coloring layer is disposed above the corresponding aperture,the color of the transmissive display can be more finely tuned.

[0018] Also, in another electrooptical device substrate according to thepresent invention, for forming coloring layers thereon, each comprisinga hypochromic portion and a hyperchromic portion having a higher lightdensity than the hypochromic portion, and for forming a reflectivelayer, including apertures, thereon, the hypochromic portion is disposedon the reflective layer, the hyperchromic portion is disposed above thecorresponding aperture, and a part of the hypochromic portion is alsodisposed above the corresponding aperture.

[0019] In the electrooptical device substrate according to the presentinvention, since a part of the hypochromic portion is disposed above thecorresponding aperture, the level of light modulation can be changed inaccordance with the three areas of the hyperchromic portion above thecorresponding aperture, the hypochromic portion above the correspondingaperture, and the region in which no coloring layer is disposed abovethe corresponding aperture, the color of the transmissive display can befinely tuned.

[0020] Furthermore, in another electrooptical device substrate accordingto the present invention, for forming coloring layers thereon, eachcomprising a hypochromic portion and a hyperchromic portion having ahigher light density than the hypochromic portion, and for forming areflective layer, including apertures, thereon, the hyperchromic portionis disposed above the corresponding aperture, the hypochromic portion isdisposed on the reflective layer, and there is a region in which nohypochromic portion is disposed on a part of the reflective layer.

[0021] In the electrooptical device substrate according to the presentinvention, since there is a region in which no hypochromic portion isdisposed on a part of the reflective layer, the color of the reflectivedisplay can be tuned in accordance with the ratio of the area of thehypochromic portion on the reflective layer to that of the foregoingregion, and thus the level of light modulation can be lowered incomparison to the configuration in which the hypochromic portion isdisposed so as to cover the entire reflective layer.

[0022] In the electrooptical device substrate according to the presentinvention, the hyperchromic portion is preferably disposed in at leastone part of the region. With this configuration, since the level oflight modulation can be changed in accordance with the three areas ofthe hypochromic portion on the reflective layer, the hyperchromicportion on the reflective layer, and the region in which no coloringlayer is disposed on the reflective layer, the color of the reflectivedisplay can be more finely tuned.

[0023] Moreover, in another electrooptical device substrate according tothe present invention, for forming coloring layers thereon, eachcomprising a hypochromic portion and a hyperchromic portion having ahigher light density than the hypochromic portion, and for forming areflective layer, including apertures, thereon, the hyperchromic portionis disposed above the corresponding aperture, the hypochromic portion isdisposed on the reflective layer, and a part of the hyperchromic portionis also disposed on the reflective layer.

[0024] In the electrooptical device substrate according to the presentinvention, since a part of the hyperchromic portion is disposed on thereflective layer, the level of light modulation can be changed inaccordance with the three areas of the hyperchromic portion on thereflective layer, the hypochromic portion on the reflective layer, andthe region in which no coloring, layer is disposed on the reflectivelayer, and thus the color of the reflective display can be finely tuned.

[0025] In the electrooptical device substrate according to the presentinvention, at least one part of the hypochromic portion may overlap atleast one part of the hyperchromic portion. Since the hypochromicportion and the hyperchromic portion overlap each other, a region inwhich the coloring layer is not formed because of a gap between thehypochromic portion and the hyperchromic portion is unlikely to beproduced, and the level of light modulation in the reflective display orin the transmissive display can be made higher than the configuration inwhich only the hypochromic portion is disposed on the entire reflectivelayer or only the hyperchromic portion is disposed above thecorresponding whole aperture, thereby allowing the light to be tunedover a wider range.

[0026] An electrooptical device according to the present inventioncomprises an electrooptical layer composed of an electroopticalmaterial; a substrate lying along the electrooptical layer; a reflectivelayer which includes apertures and which is disposed on the substrate;and coloring layers disposed on the substrate, each coloring layercomprising a hypochromic portion and a hyperchromic portion having ahigher light density than the hypochromic portion. The hypochromicportion is disposed on the reflective layer and the hyperchromic portionis disposed above the corresponding aperture. In addition, there is aregion in which no hyperchromic portion is disposed above a part of thecorresponding aperture.

[0027] In the electrooptical device according to the present invention,the hypochromic portion is preferably disposed in at least one part ofthe region.

[0028] Also, another electrooptical device according to the presentinvention comprises a substrate; coloring layers disposed on thesubstrate, each coloring layer having a hypochromic portion and ahyperchromic portion having a higher light density than the hypochromicportion; and a reflective layer which includes apertures and which isdisposed on the substrate. The hypochromic portion is disposed on thereflective layer and the hyperchromic portion is disposed above thecorresponding aperture. In addition, a part of the hypochromic portionis also disposed above the corresponding aperture.

[0029] Furthermore, another electrooptical device according to thepresent invention comprises an electrooptical layer composed of anelectrooptical material; a substrate lying along the electroopticallayer; a reflective layer which includes apertures and which is disposedon the substrate; and coloring layers disposed on the substrate, eachcoloring layer having a hypochromic portion and a hyperchromic portionhaving a higher light density than the hypochromic portion. Thehypochromic portion is disposed on the reflective layer and thehyperchromic portion is disposed above the corresponding aperture. Inaddition, there is a region in which no hypochromic portion is disposedon a part of the reflective layer.

[0030] In the electrooptical device according to the present invention,the hyperchromic portion is preferably disposed in at least one part ofthe region.

[0031] Moreover, another electrooptical device according to the presentinvention comprises a substrate; coloring layers disposed on thesubstrate, each coloring layer having a hypochromic portion and ahyperchromic portion having a higher light density than the hypochromicportion; and a reflective layer which includes apertures and which isdisposed on the substrate. The hypochromic portion is disposed on thereflective layer and the hyperchromic portion is disposed above thecorresponding aperture. In addition, a part of the hyperchromic portionis also disposed on the reflective layer.

[0032] In the electrooptical device according to the present invention,preferably at least one part of the hypochromic portion may overlap atleast one part of the hyperchromic portion.

[0033] Some of other electrooptical devices according to the presentinvention have a counter substrate disposed so as to oppose thesubstrate via the electrooptical layer.

[0034] Another electrooptical device according to the present inventioncomprises an electrooptical layer composed of an electroopticalmaterial; a substrate lying along the electrooptical layer; a reflectivelayer which includes apertures and which is disposed on the substrate; acounter substrate disposed so as to oppose the substrate; and coloringlayers disposed on the counter substrate, each coloring layer having ahypochromic portion and a hyperchromic portion having a higher lightdensity than the hypochromic portion. The hypochromic portion isdisposed so as to two-dimensionally overlap the reflective layer and thehyperchromic portion is disposed so as to two-dimensionally overlap thecorresponding aperture. In addition, there is a region whichtwo-dimensionally overlaps a part of the corresponding aperture and inwhich no hyperchromic portion is disposed.

[0035] In the electrooptical device according to the present invention,preferably the hypochromic portion is also disposed in at least one partof the region.

[0036] Also, another electrooptical device according to the presentinvention comprises a substrate; coloring layers disposed on thesubstrate, each coloring layer having a hypochromic portion and ahyperchromic portion having a higher light density than the hypochromicportion; and a reflective layer which includes apertures and which isdisposed on the substrate. The hypochromic portion is disposed on thereflective layer and the hyperchromic portion is disposed above thecorresponding aperture. In addition, a part of the hypochromic portionis disposed so as to two-dimensionally overlap the correspondingaperture.

[0037] Furthermore, another electrooptical device according to thepresent invention comprises an electrooptical layer composed of anelectrooptical material; a substrate lying along the electroopticallayer; a reflective layer which includes apertures and which is disposedon the substrate; a counter substrate disposed so as to oppose thesubstrate; and coloring layers disposed on the counter substrate, eachcoloring layer having a hypochromic portion and a hyperchromic portionhaving a higher light density than the hypochromic portion. Thehypochromic portion is disposed so as to two-dimensionally overlap thereflective layer, and the hyperchromic portion is disposed so as totwo-dimensionally overlap the corresponding aperture. In addition, thereis a region which two-dimensionally overlaps a part of the reflectivelayer and in which no hypochromic portion is disposed.

[0038] In the electrooptical device according to the present invention,preferably the hyperchromic portion is also disposed in at least onepart of the region.

[0039] Moreover, another electrooptical device according to the presentinvention comprises an electrooptical layer composed of anelectrooptical material; a substrate lying along the electroopticallayer; a reflective layer which includes apertures and which is disposedon the substrate; a counter substrate disposed so as to oppose thesubstrate; and coloring layers disposed on the counter substrate, eachcoloring layer having a hypochromic portion and a hyperchromic portionhaving a higher light density than the hypochromic portion. Thehypochromic portion is disposed so as to two-dimensionally overlap thereflective layer and the hyperchromic portion is disposed so as totwo-dimensionally overlap the corresponding aperture. In addition, apart of the hyperchromic portion is also disposed so as totwo-dimensionally overlap the reflective layer.

[0040] In the electrooptical device according to the present invention,at least one part of the hypochromic portion may two-dimensionallyoverlap at least one part of the hyperchromic portion.

[0041] Also, another electrooptical device according to the presentinvention comprises a pair of substrates; an electrooptical layer whichcomprises an electrooptical material and which is held between the pairof substrates; a reflective layer which includes apertures and which isdisposed between the pair of substrates; a hypochromic layer disposed ateach pixel on one of the pair of substrates lying along theelectrooptical layer; and a hyperchromic layer which is disposed at eachpixel on the other of the pair of substrates and which has a higherlight density than the hypochromic layer. The hypochromic layer isdisposed so as to two-dimensionally overlap the reflective layer and thehyperchromic layer is disposed so as to two-dimensionally overlap thecorresponding aperture. In addition, there is a region whichtwo-dimensionally overlaps a part of the corresponding aperture and inwhich no hyperchromic layer is disposed.

[0042] In the electrooptical device according to the present invention,preferably the hypochromic layer is also disposed so as to overlap atleast one part of the region.

[0043] Also, another electrooptical device according to the presentinvention comprises a pair of substrates; an electrooptical layer whichcomprises an electrooptical material and which is held between the pairof substrates; a reflective layer which includes apertures and which isdisposed between the pair of substrates; a hypochromic layer disposed ateach pixel on one of the pair of substrates lying along theelectrooptical layer; and a hyperchromic layer which is disposed at eachpixel on the other of the pair of substrates and which has a higherlight density than the hypochromic layer. The hypochromic layer isdisposed so as to two-dimensionally overlap the reflective layer and thehyperchromic layer is disposed so as to two-dimensionally overlap thecorresponding aperture. In addition, a part of the hypochromic layer isalso disposed so as to two-dimensionally overlap the correspondingaperture.

[0044] Also, another electrooptical device according to the presentinvention comprises a pair of substrates; an electrooptical layer whichcomprises an electrooptical material and which is held between the pairof substrates; a reflective layer which includes apertures and which isdisposed between the pair of substrates; a hypochromic layer disposed ateach pixel on one of the pair of substrates lying along theelectrooptical layer; and a hyperchromic layer which is disposed at eachpixel on the other of the pair of substrates and which has a higherlight density than the hypochromic layer. The hypochromic layer isdisposed so as to two-dimensionally overlap the reflective layer and thehyperchromic layer is disposed so as to two-dimensionally overlap thecorresponding aperture. In addition, there is a region whichtwo-dimensionally overlaps a part of the reflective layer and in whichno hypochromic layer is disposed.

[0045] In the electrooptical device according to the present invention,preferably the hyperchromic layer is also disposed so as to overlap atleast one part of the region.

[0046] Also, another electrooptical device according to the presentinvention comprises a pair of substrates; an electrooptical layer whichcomprises an electrooptical material and which is held between the pairof substrates; a reflective layer which includes apertures and which isdisposed between the pair of substrates; a hypochromic layer disposed ateach pixel on one of the pair of substrates lying along theelectrooptical layer; and a hyperchromic layer which is disposed at eachpixel on the other of the pair of substrates and which has a higherlight density than the hypochromic layer. The hypochromic layer isdisposed so as to two-dimensionally overlap the reflective layer and thehyperchromic layer is disposed so as to two-dimensionally overlap thecorresponding aperture. In addition, a part of the hyperchromic layer isalso disposed so as to two-dimensionally overlap the reflective layer.

[0047] In the electrooptical device according to the present invention,at least one part of the hypochromic layer may two-dimensionally overlapat least one part of the hyperchromic layer.

[0048] A method for fabricating an electrooptical device substrateaccording to the present invention comprises the steps of formingcoloring layers on a substrate, each coloring layer having a hypochromicportion and a hyperchromic portion having a higher light density thanthe hypochromic portion; and forming a reflective layer, includingapertures, on the substrate. In the step of forming the coloring layers,the hyperchromic portion is formed so as to two-dimensionally overlapthe corresponding aperture, the hypochromic portion is formed so as totwo-dimensionally overlap the reflective layer, and a region whichoverlaps a part of the corresponding aperture and in which nohyperchromic portion is disposed is formed.

[0049] In the method for fabricating the electrooptical device substrateaccording to the present invention, preferably the hypochromic portionis also formed so as to overlap at least one part of the region.

[0050] A method for fabricating another electrooptical device substrateaccording to the present invention comprises the steps of formingcoloring layers on a substrate, each coloring layer having a hypochromicportion and a hyperchromic portion having a higher light density thanthe hypochromic portion; and forming a reflective layer, includingapertures, on the substrate. In the step of forming the coloring layers,the hyperchromic portion is formed so as to two-dimensionally overlapthe corresponding aperture, the hypochromic portion is formed so as totwo-dimensionally overlap the reflective layer, and a part of thehypochromic portion is also formed so as to two-dimensionally overlapthe corresponding aperture.

[0051] A method for fabricating another electrooptical device substrateaccording to the present invention comprises the steps of formingcoloring layers on a substrate, each coloring layer having a hypochromicportion and a hyperchromic portion having a higher light density thanthe hypochromic portion; and forming a reflective layer, includingapertures, on the substrate. In the step of forming the coloring layers,the hyperchromic portion is formed so as to two-dimensionally overlapthe corresponding aperture, the hypochromic portion is formed so as totwo-dimensionally overlap the reflective layer, and a region whichtwo-dimensionally overlaps the reflective layer and in which nohypochromic portion is disposed is formed.

[0052] In the method for fabricating the electrooptical device substrateaccording to the present invention, preferably the hyperchromic portionis also formed so as to overlap at least one part of the region.

[0053] A method for fabricating another electrooptical device substrateaccording to the present invention comprises the steps of formingcoloring layers on a substrate, each coloring layer having a hypochromicportion and a hyperchromic portion having a higher light density thanthe hypochromic portion; and forming a reflective layer, includingapertures, on the substrate. In the step of forming the coloring layers,the hyperchromic portion is formed so as to two-dimensionally overlapthe corresponding aperture, the hypochromic portion is formed so as totwo-dimensionally overlap the reflective layer, and a part of thehyperchromic portion is also formed so as to two-dimensionally overlapthe reflective layer.

[0054] A method for fabricating another electrooptical device accordingto the present invention comprises the steps of forming coloring layerson a substrate, each coloring layer having a hypochromic portion and ahyperchromic portion having a higher light density than the hypochromicportion; and forming a reflective layer, including apertures, on thesubstrate or on a counter substrate which opposes the substrate. In thestep of forming the coloring layers, the hyperchromic portion is formedso as to two-dimensionally overlap the corresponding aperture, thehypochromic portion is formed so as to two-dimensionally overlap thereflective layer, and a region which two-dimensionally overlaps thecorresponding aperture and in which no hyperchromic portion is disposedis formed.

[0055] In the method for fabricating the electrooptical device accordingto the present invention, preferably the hypochromic portion is alsoformed so as to overlap at least one part of the region.

[0056] A method for fabricating another electrooptical device accordingto the present invention comprises the steps of forming coloring layerson a substrate, each coloring layer having a hypochromic portion and ahyperchromic portion having a higher light density than the hypochromicportion; and forming a reflective layer, including apertures, on thesubstrate or on a counter substrate which opposes the substrate. In thestep of forming the coloring layers, the hyperchromic portion is formedso as to two-dimensionally overlap the corresponding aperture, thehypochromic portion is formed so as to two-dimensionally overlap thereflective layer, and a part of the hypochromic portion is also formedso as to two-dimensionally overlap the corresponding aperture.

[0057] A method for fabricating another electrooptical device accordingto the present invention comprises the steps of forming coloring layerson a substrate, each coloring layer having a hypochromic portion and ahyperchromic portion having a higher light density than the hypochromicportion; and forming a reflective layer, including apertures, on thesubstrate or on a counter substrate which opposes the substrate. In thestep of forming the coloring layers, the hyperchromic portion is formedso as to two-dimensionally overlap the corresponding aperture, thehypochromic portion is formed so as to two-dimensionally overlap thereflective layer, and a region which two-dimensionally overlaps thereflective layer and in which no hypochromic portion is disposed isformed.

[0058] In the method for fabricating the electrooptical device accordingto the present invention, preferably the hyperchromic portion is alsoformed so as to overlap at least one part of the region.

[0059] A method for fabricating another electrooptical device accordingto the present invention comprises the steps of forming coloring layerson a substrate, each coloring layer having a hypochromic portion and ahyperchromic portion having a higher light density than the hypochromicportion; and forming a reflective layer, including apertures, on thesubstrate or on a counter substrate which opposes the substrate. In thestep of forming the coloring layers, the hyperchromic portion is formedso as to two-dimensionally overlap the corresponding aperture, thehypochromic portion is formed so as to two-dimensionally overlap thereflective layer, and a part of the hyperchromic portion is also formedso as to two-dimensionally overlap the reflective layer.

[0060] A method for fabricating another electrooptical device accordingto the present invention, having an electrooptical layer which iscomposed of an electrooptical material and which is held between a pairof substrates, comprises the steps of forming a reflective layer,including apertures, between the pair of substrates; forming ahypochromic layer at each pixel on one of the pair of substrates; andforming a hyperchromic layer, having a higher light density than thehypochromic layer, at each pixel on the other of the pair of substrates.In the step of forming the hypochromic layer, the hypochromic layer isformed so as to two-dimensionally overlap the reflective layer. In thestep of forming the hyperchromic layer, the hyperchromic layer is formedso as to two-dimensionally overlap the corresponding aperture, and aregion which two-dimensionally overlaps a part of the correspondingaperture and in which no hyperchromic layer is disposed is formed.

[0061] In the method for fabricating the electrooptical device accordingto the present invention, preferably the hyperchromic layer is alsoformed so as to overlap at least one part of the region.

[0062] A method for fabricating another electrooptical device accordingto the present invention, having an electrooptical layer which iscomposed of an electrooptical material and which is held between a pairof substrates, comprises the steps of forming a reflective layer,including apertures, between the pair of substrates; forming ahypochromic layer at each pixel on one of the pair of substrates; andforming a hyperchromic layer, having a higher light density than thehypochromic layer, at each pixel on the other of the pair of substrates.In the step of forming the hypochromic layer, the hypochromic layer isformed so as to two-dimensionally overlap the reflective layer, and apart of the hypochromic layer is formed so as to two-dimensionallyoverlap the corresponding aperture. In the step of forming thehyperchromic layer, the hyperchromic layer is formed so as totwo-dimensionally overlap the corresponding aperture.

[0063] A method for fabricating another electrooptical device accordingto the present invention, having an electrooptical layer which iscomposed of an electrooptical material and which is held between a pairof substrates, comprises the steps of forming a reflective layer,including apertures, between the pair of substrates; forming ahypochromic layer at each pixel on one of the pair of substrates; andforming a hyperchromic layer, having a higher light density than thehypochromic layer, at each pixel on the other of the pair of substrates.In the step of forming the hypochromic layer, the hypochromic layer isformed so as to two-dimensionally overlap the reflective layer, and aregion which two-dimensionally overlap the reflective layer and in whichno hypochromic layer is disposed is formed. In the step of forming thehyperchromic layer, the hyperchromic layer is formed so as totwo-dimensionally overlap the corresponding aperture.

[0064] In the method for fabricating the electrooptical device accordingto the present invention, preferably the hyperchromic layer is alsoformed so as to overlap at least one part of the region.

[0065] A method for fabricating another electrooptical device accordingto the present invention, having an electrooptical layer which iscomposed of an electrooptical material and which is held between a pairof substrates, comprises the steps of forming a reflective layer,including apertures, between the pair of substrates; forming ahypochromic layer at each pixel on one of the pair of substrates; andforming a hyperchromic layer, having a higher light density than thehypochromic layer, at each pixel on the other of the pair of substrates.In the step of forming the hypochromic layer, the hypochromic layer isformed so as to two-dimensionally overlap the reflective layer. In thestep of forming the hyperchromic layer, the hyperchromic layer is formedso as to two-dimensionally overlap the corresponding aperture, and apart of the hyperchromic layer is formed so as to two-dimensionallyoverlap the reflective layer.

[0066] In a method for tuning the color of a color filter according tothe present invention, when a hypochromic portion and a hyperchromicportion having a higher light density than the hypochromic portion areprovided in each coloring region which is disposed in substantially thesame optical state in the color filter, the color of the coloring regionis tuned by changing at least one of the areas of the hypochromicportion and the hyperchromic portion in the coloring region.

[0067] In the method for tuning the color of a color filter according tothe present invention, since both the hypochromic portion and thehyperchromic portion are formed in the coloring region and the color ofthe coloring region is tuned by changing at least one of the areas ofthe hypochromic portion and the hyperchromic portion, tuning the colordensity of the material for forming the coloring layer can beeliminated, and thus a desired color of the color filter is easilyobtained at low cost. The foregoing coloring region may have a region inwhich the hypochromic portion and the hyperchromic portion overlap eachother or alternatively a region in which neither the hypochromic portionnor the hyperchromic portion is formed.

[0068] In the method for tuning the color of the color filter accordingto the present invention, when a reflective coloring region whichtwo-dimensionally overlaps a reflective layer and a transmissivecoloring region which does not two-dimensionally overlap the reflectivelayer are formed in the color filter, and the hypochromic portion andthe hyperchromic portion are mainly formed in the reflective coloringregion and the transmissive coloring region, respectively, the color ofat least one of the reflective coloring region and the transmissivecoloring region is preferably tuned as the color of the foregoingcoloring region. With this method, by tuning the color of at least oneof the reflective coloring region and the transmissive coloring region,the color of at least one of the reflective display and the transmissivedisplay can be easily tuned at low cost in a desired manner.

[0069] In the foregoing solving means, in order to reduce the differencein color between the reflective display and the transmissive display,the light density of the foregoing hyperchromic portion is preferablyabout twice that of the hypochromic portion, and is more preferably in arange from 1.4 to 2.6 times that of the hypochromic portion. Inparticular, in order to reduce the difference in the perceived colorbetween the reflective display and the transmissive display, the lightdensity of the hyperchromic portion is preferably in a range from 1.7 to2.3 times that of the hypochromic portion. By arranging the opticaldensities as described above, when the hypochromic portion and thehyperchromic portion in the coloring layer are formed so as to havesubstantially the same thickness, a filtering effect for the reflectedlight can be made substantially the same as that for the transmittedlight. Also, in the foregoing range of the light density, the differencein color between the reflective display and the transmissive display canbe easily reduced by adjusting at least one of the areas of thehypochromic portion (hypochromic layer) and the hyperchromic portion(hyperchromic layer).

[0070] Furthermore, in the foregoing solving means, when the color ofthe transmissive display is emphasized with respect to the reflectivedisplay, the light density of the foregoing hyperchromic portion ispreferably twice or more that of the hypochromic portion. By arrangingthe optical densities as describe above, the color of the transmissivedisplay can be improved with respect to the reflective display.

[0071] In the foregoing solving means, either a stacked black matrixformed of stacked coloring layers, each representing a different hue, ora black light-shielding layer composed of a black material is sometimesformed in the spaces between the adjacent color filters. When thestacked black matrix is formed, the foregoing hyperchromic layers aredesirably used as the plurality of coloring layers representingdifferent hues in order to improve the light-shielding effect thereof.

[0072] In the present invention, a reflective layer is defined as theone which has a reflective surface effectively performing the reflectingfunction. Therefore, even if a reflective layer is formed in practice,it is not included in this invention when it does not effectivelyperform the reflecting function, for example, by being covered by alight-shielding layer.

BRIEF DESCRIPTION OF THE DRAWINGS

[0073]FIG. 1 is a schematic sectional view illustrating the structure ofa liquid crystal display according to a first embodiment of the presentinvention.

[0074]FIG. 2 is a schematic sectional view illustrating the structure ofa liquid crystal display according to a second embodiment of the presentinvention.

[0075]FIG. 3 is a schematic sectional view illustrating the structure ofa liquid crystal display according to a third embodiment of the presentinvention.

[0076]FIG. 4 is a schematic sectional view illustrating the structure ofa liquid crystal display according to a fourth embodiment of the presentinvention.

[0077]FIG. 5 is a schematic sectional view illustrating the structure ofa liquid crystal display according to a fifth embodiment of the presentinvention.

[0078]FIG. 6 is a schematic plan view illustrating the two-dimensionalstructure of an electrooptical device substrate according to the firstembodiment.

[0079]FIG. 7 includes schematic process charts FIGS. 7(a) to 7(d) of amethod for fabricating the electrooptical device substrate according toa sixth embodiment of the present invention.

[0080]FIG. 8 includes schematic process charts FIGS. 8(a) to 8(d) of amethod for fabricating the electrooptical device substrate according toa seventh embodiment of the present invention.

[0081]FIG. 9 includes schematic partial sectional views FIGS. 9(a) to9(d) illustrating other example configurations applicable to theabove-described embodiments.

[0082]FIG. 10 is an x-y chromaticity diagram illustrating a tuningeffect of colors according to the present invention.

[0083]FIG. 11 is a schematic sectional view illustrating the structureof a known transflective liquid crystal display panel.

[0084]FIG. 12 is a schematic block diagram illustrating theconfiguration of an electronic apparatus according to the presentinvention.

[0085]FIG. 13 is a perspective view of the external appearance of aportable phone as an example electronic apparatus.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0086] Electrooptical device substrates, electrooptical devices, andmethods for fabricating the electrooptical device substrates and theelectrooptical devices according to embodiments of the present inventionwill be described in further detail with reference to the accompanyingdrawings.

[0087] First Embodiment

[0088]FIG. 1 is a schematic sectional view illustrating a substrate 210which is an electrooptical device substrate according to a firstembodiment of the present invention and a liquid crystal display panel200 of an electrooptical device using the electrooptical devicesubstrate according to the first embodiment.

[0089] The liquid crystal display panel 200 is constructed such that thesubstrate 201 and a substrate 202 composed of glass, plastic, or thelike are bonded to each other with sealing adhesive 203, and liquidcrystal 204 is injected into the space formed therebetween. Transparentelectrodes 221, retardation films 205 and 207, and polarizers 206 and208 formed on the substrate 202 are completely identical to those of theforegoing known example shown in FIG. 11.

[0090] In this embodiment, the substrate 201 has a reflective layer 211,having apertures 211 a, formed on the inner surface thereof in the samefashion as the known example. The reflective layer 211 is formed of athin film composed of aluminum, an aluminum alloy, a silver alloy, orthe like. At least one aperture 211 a is formed at each of pixels G,which are arranged in a matrix manner on the inner surface of thesubstrate 201, so as to have a predetermined aperture ratio (e.g., 10 to30%) with respect to the total area of the corresponding pixel G.

[0091]FIG. 6 is a plan view of the substrate 201 viewed from the above.The apertures 211 a are configured so as to have, for example, arectangular shape in plan view, as indicated by a dotted lead line inFIG. 6, and formed substantially at the center of the pixels G. However,since the positions, the shapes, and the number of the apertures 211 aare not limited, a plurality of apertures may be formed at each pixelinstead of one aperture formed at each pixel as in this embodiment.

[0092] The foregoing reflective layer 211 has coloring layers 212 r, 212g, and 212 b thereon which consist of three colors, i.e., R (red), G(green), and B (blue), respectively, for example, in the case of a colorfilter using the primary colors, and which are disposed in anappropriate array pattern such as a known stripe array, delta array(triangle array), or slanted mosaic array (diagonal array), wherein onecoloring layer is disposed at each pixel G, (a color filter having astripe array is shown in FIG. 6). The adjacent pixels G have a stackedblack matrix 212BM therebetween formed by stacking together the coloringlayers 212 r, 212 g, and 212 b so as to provide a light shieldingeffect. Each of the coloring layers 212 r, 212 g, and 212 b is basicallyformed so as to have a substantially flat surface except for the regionof the stacked black matrix 212BM.

[0093] FIGS. 1(A) and 1(B) are magnified views of the example structuresof one pixel. Each of the coloring layers 212 r, 212 g, and 212 b has ahyperchromic portion 212 c above the corresponding aperture 211 a of theforegoing reflective layer 211 and a hypochromic portion 212 d which hasa lower light density than the hyperchromic portion 212 c and which liesin the coloring layer except for the region where there is thehyperchromic portion 212 c. The hyperchromic portion 212 c having a highlight density is formed so that the density of a colorant, such as apigment, a dye, or the like, dispersed in, for example, alight-transmissive resin is higher than that in the hypochromic portion212 d.

[0094] The foregoing coloring layers 212 r, 212 g, and 212 b and thestacked black matrix 212BM have an overcoat film 212 p thereon composedof a transparent resin or the like. The overcoat film 212 p is intendedto protect the coloring layers from corrosion by or exposure to achemical substance or the like during the fabrication steps and also tomake the surface of a color filter 212 flat.

[0095] The color filter 212 has transparent electrodes 213 thereoncomposed of a transparent conductor such as ITO (indium tin oxide). Inthis embodiment, the transparent electrodes 213 are formed in a stripearray, that is, the plural transparent electrodes 213 are disposed inparallel to each other. Also, the transparent electrodes 213 extendalong a direction orthogonal to the transparent electrodes 221 formed onthe foregoing substrate 202 in the same stripe array as the transparentelectrodes 213. Each pixel G is formed by one component part of theliquid crystal display panel 200, wherein the component parts areincluded in the regions where the transparent electrodes 213 and thetransparent electrodes 221 overlap (shown by a dotted chain line in FIG.6), that is, in the foregoing overlapped regions where there are thereflective layer 211, the color filters 212, the transparent electrodes213, the liquid crystal 204, and the transparent electrodes 221.

[0096] In this embodiment, in each of at least one group of the coloringlayers 212 r, 212 g, and 212 b, there is a region in which nohyperchromic portion 212 c is disposed above the corresponding aperture211 a, as shown in FIG. 1(A); instead, the hypochromic portion 212 d isdisposed in this region. In other words, a part of the hypochromicportion 212 d is disposed above the corresponding aperture 211 a. Moreparticularly, the hypochromic portion 212 d is formed around thecorresponding aperture 211 a instead of the hyperchromic portion 212 c.

[0097] Alternatively, in each of at least one group of the coloringlayers 212 r, 212 g, and 212 b, there may be a region in which nohypochromic portion 212 d is disposed on the reflective layer 211, asshown in FIG. 1(B); instead, the hyperchromic portion 212 c may bedisposed in this region. In other words, a part of the hyperchromicportion 212 c may also be disposed on the reflective layer 211.

[0098] In this embodiment, since the foregoing color filter 212 has thehyperchromic portions 212 c, each formed above the correspondingaperture 211 a of the reflective layer 211 and having a higher lightdensity than the rest of the corresponding coloring layer, the chroma oflight passing through the hyperchromic portion 212 c of each of thecoloring layers 212 r, 212 g, and 212 b is high and that of lightpassing through the hypochromic portion 212 d lying in the rest of thecoloring layer is relatively low.

[0099] In the liquid crystal display panel 200, when reflective displayis performed, light is transmitted along a reflecting path R and isvisible, and when transmissive display is performed, light istransmitted along a transmitting path T and is visible. Although thecolor filter 212 has the same function for the light transmitted alongthe reflecting path R as the conventional color filter, since thetransmitting path T extends through the corresponding aperture 211 a ofthe reflective layer 211, the transmitted light is transmitted throughthe hyperchromic portion 212 c of each of the coloring layers 212 r, 212g, and 212 b, and consequently the chroma of the transmissive display isimproved in comparison to that of the transmissive display in theconventional liquid crystal display panel shown in FIG. 11.

[0100] Thus, in this embodiment, by forming the hyperchromic portions212 c, each in the region two-dimensionally overlapping thecorresponding aperture 211 a of the reflective layer 211 of the colorfilter 212, the chroma of the transmissive display can be improvedwithout sacrificing the brightness of the reflective display. Inparticular, the difference in the perceived color between the reflectivedisplay and the transmissive display can be reduced when compared tothat in the conventional liquid crystal display panel.

[0101] When the hyperchromic portions 212 c are as thick as thehypochromic portions 212 d, the foregoing hyperchromic portions 212 care preferably configured such that light passing through thehyperchromic portions 212 c has substantially the same perceived coloras the same light passing through the hypochromic portions 212 d whichwould be twice as thick as the hyperchromic portions 212 c. In thisspecification, it is assumed that the color density of the hyperchromicportions 212 c is twice that of the hypochromic portions 212 d. Moreparticularly, by using this color density, the color density of thehyperchromic portions 212 c is preferably in a range from 1.4 to 2.6times, and more preferably in a range from 1.7 to 2.3 times that of thehypochromic portions 212 d. With this arrangement, the difference in thedegree of chroma between the reflective display and the transmissivedisplay can be further reduced, and thus the difference in the perceivedcolor between these two displays can be further reduced.

[0102] Also, in this embodiment, each of the coloring layers 212 r, 212g, and 212 b has the hypochromic portion 212 d and the hyperchromicportion 212 c two-dimensionally disposed therein, thereby reducing theunevenness in the surface profile (the upper surface profile shown inthe figure) of each of the coloring layers 212 r, 212 g, and 212 b. Inparticular, by making the hypochromic portion 212 d as thick as thehyperchromic portion 212 c, the flatness of the coloring layers can beimproved. Accordingly, the flatness of the color filter 212 can beimproved, leading to an improved display quality of the liquid crystaldisplay panel.

[0103] Although, in this embodiment, the chroma of the transmissivedisplay is improved while maintaining the brightness of the reflectivedisplay to be bright as described above, in general, a color of eachdisplay is required to be tuned if necessary in accordance with thesetting of an apparatus in which the liquid crystal display panel isinstalled, the amount of light from a backlight, or the like. For thisrequirement, a desired color is conventionally achieved by tuning thedensity of a colorant such as a dye or a pigment contained in a material(a photosensitive resin or the like) of the coloring layer. However, theabove-described method of tuning the density of the colorant gives riseto problems in that, since the color can be evaluated as to whether itis desirable or not only when a new material (photosensitive resin)containing a colorant having the tuned density is prepared and thencoloring layers are actually fabricated by way of trial, costlymaterials and a lot of work for the above-described evaluations areneeded.

[0104] In view of these problems, in this embodiment, both thehyperchromic portion 212 c and the hypochromic portion 212 d are formedso as to lie in the region above the corresponding aperture 211 a asshown in FIG. 1(A). With this arrangement, since both the hyperchromicportion 212 c and the hypochromic portion 212 d contribute todetermining the color of the transmissive display in the region abovethe corresponding aperture 211 a, the color of the transmissive displaycan be tuned by changing at least one of the areas of the hyperchromicportion 212 c and the hypochromic portion 212 d formed in the regionabove the corresponding aperture. In this case, each of the RGB colorsof the transmissive display can be obtained, in an x-y chromaticitydiagram in FIG. 10, from a corresponding dotted chain line lying betweena circled mark representing the corresponding color of the hyperchromicportion 212 c and a square mark representing the corresponding color ofthe hypochromic portion 212 d.

[0105] Also, as shown in FIG. 1(B), by forming both the hyperchromicportion 212 c and the hypochromic portion 212 d so as to lie in theregion on the reflective layer 211 at each pixel, both the hyperchromicportion 212 c and the hypochromic portion 212 d contribute todetermining the color of the transmissive display in the region on thereflective layer 211. With this arrangement, the color of the reflectivedisplay can be tuned by changing at least one of the areas of thehyperchromic portion 212 c and the hypochromic portion 212 d formed inthe region on the reflective layer. In this case, each of the RGB colorsof the reflective display can be obtained, in the x-y chromaticitydiagram in FIG. 10, from the corresponding dotted chain line lyingbetween the circled mark representing the corresponding color of thehyperchromic portion 212 c and the square mark representing thecorresponding color of the hypochromic portion 212 d.

[0106] The configuration shown in FIG. 1(A) or 1(B) is realized in orderto achieve at least one color from a plurality of colors as required.Also, although both the hypochromic portion and the hyperchromic portionlie either above the corresponding aperture or on the reflective layerat each pixel in the foregoing configuration, both the hypochromicportion and the hyperchromic portion may lie above the correspondingaperture and also on the reflective layer. In this case, the colors ofboth the reflective display and the transmissive display can be tuned.

[0107] Second Embodiment

[0108] Referring now to FIG. 2, an electrooptical device substrate 301and a liquid crystal display panel 300 according to a second embodimentof the present invention will be described. In this embodiment, sincethe substrate 301, a substrate 302, sealing adhesive 303, liquid crystal304, transparent electrodes 313 and 321, retardation films 305 and 307,and polarizers 306 and 308 are provided in a similar fashion to thefirst embodiment, a repeated description thereof will be omitted.

[0109] In this embodiment, the substrate 301 has a reflective layer 311having apertures 311 a on the surface thereof, and the reflective layer311 has coloring layers 312 r, 312 g, and 312 b formed thereon, onecoloring layer disposed at each pixel. Each coloring layer is formed inthe overall corresponding pixel so as to cover the correspondingaperture 311 a. The coloring layer has a hypochromic portion 312 d,formed on the foregoing reflective layer 311 over the whole pixel (referto FIG. 2(A) or 2(B)), and a hyperchromic portion 312 c which is stackedon the hypochromic portion 312 d and which has the same hue as thehypochromic portion and a higher color density than the hypochromicportion.

[0110] In this embodiment, as shown in FIG. 2(A), there is a region inwhich no hyperchromic layer 312 c is disposed above the correspondingaperture 311 a. With this arrangement, since there are a region in whichonly the hypochromic layer 312 d is disposed and another region in whichthe hyperchromic layer 312 c overlaps the hypochromic layer 312 d, bothbeing disposed above the corresponding aperture 311 a, the color of thetransmissive display can be tuned by changing the area of thehyperchromic layer 312 c.

[0111] Alternatively, as shown in FIG. 2(B), a part of the hyperchromiclayer 312 c may be disposed on the reflective layer 311. In this case,since there are a region in which the hyperchromic layer 312 c overlapsthe hypochromic layer 312 d and another region in which only thehypochromic layer 312 d is disposed, both being disposed on thereflective layer 311, the color of the reflective display can be tunedby changing the area of the hyperchromic layer 312 c.

[0112] In this embodiment, since each of the coloring layers 312 r, 312g, and 312 b forms a stacked structure with the hypochromic portion 312d and the hyperchromic portion 312 c, light traveling along thereflecting path R passes through only the hypochromic portion in thesame manner as in the first embodiment, and light traveling along thetransmitting path T passes through both the hypochromic portion and thehyperchromic portion 312 c, which is different from the firstembodiment. As a result, the chroma of the transmissive display can beimproved in a similar fashion to the first embodiment, and thedifference in the perceived color between the reflective display and thetransmissive display can be reduced. In this case, since the transmittedlight is transmitted through both the hypochromic portion and thehyperchromic portion, the hyperchromic portion 312 c in this embodimentcan be made thinner than that in the first embodiment. For example, whenthe light density of the hyperchromic portion is twice that of thehypochromic portion, the hyperchromic portion 312 c can be made half asthin as the hypochromic portion so as to achieve optical characteristicsin this embodiment which are equivalent to those in the firstembodiment.

[0113] The configuration shown in FIG. 2(A) or 1(B) is realized in orderto achieve at least one color from a plurality of colors as required.Also, although both the hypochromic portion and the hyperchromic portionlie either above the corresponding aperture or on the reflective layerat each pixel in the foregoing configuration, both the hypochromicportion and the hyperchromic portion may lie together above thecorresponding aperture and on the reflective layer. In this case, thecolors of both the reflective display and the transmissive display canbe tuned.

[0114] Third Embodiment

[0115] Referring now to FIG. 3, an electrooptical device substrate 410and a liquid crystal display panel 400 according to a third embodimentof the present invention will be described. Also, in this embodiment,since the substrate 401, a substrate 402, sealing adhesive 403, liquidcrystal 404, transparent electrodes 413 and 421, retardation films 405and 407, and polarizers 406 and 408 are provided in a similar fashion tothe first embodiment, a repeated description thereof will be omitted.

[0116] Also, in this embodiment, the substrate 401 has a reflectivelayer 411 thereon having apertures 411 a, and the reflective layer 411has a color filter 412, directly formed thereon, having coloring layers412 r, 412 g, and 412 b, a stacked black matrix 412BM, and an overcoatfilm 412 p, in a similar fashion to the foregoing embodiments.

[0117] In this embodiment, the substrate 401 has hyperchromic portions412 c formed thereon, one disposed at each pixel and serving as a partof each of the foregoing coloring layers, and the hyperchromic portion412 c has a hypochromic portion 412 d formed thereon in thecorresponding overall pixel, and has an light density lower than thehyperchromic portion 412 c (refer to FIG. 3(A) or 3(B)).

[0118] In this embodiment, as shown in FIG. 3(A), there is a region inwhich no hyperchromic layer 412 c is disposed above the correspondingaperture 411 a. With this arrangement, since there are a region in whichonly the hypochromic layer 412 d is disposed above the correspondingaperture 411 a and another region in which the hypochromic layer 412 doverlaps the hyperchromic layer 412 c, the color of the transmissivedisplay can be tuned by changing the area of the hyperchromic layer 412c.

[0119] Alternatively, as shown in FIG. 3(B), a part of the hyperchromiclayer 412 c may be disposed on the reflective layer 411. In this case,since there are a region in which the hypochromic layer 412 d overlapsthe hyperchromic layer 412 c and another region in which only thehypochromic layer 412 d is disposed, both being disposed on thereflective layer 411, the color of the reflective display can be tunedby changing the area of the hyperchromic layer 412 c.

[0120] The configuration shown in FIG. 3(A) or 3(B) is realized in orderto achieve at least one color from a plurality of colors as required.Also, although both the hypochromic portion and the hyperchromic portionlie either above the corresponding aperture or on the reflective layerat each pixel in the foregoing configuration, both the hypochromicportion and the hyperchromic portion may lie together above thecorresponding aperture and on the reflective layer. In this case, thecolors of both the reflective display and the transmissive display canbe tuned.

[0121] Fourth Embodiment

[0122] Referring now to FIG. 4, an electrooptical device substrate 502and a liquid crystal display panel 500 according to a fourth embodimentof the present invention will be described. Also in this embodiment,since a substrate 501 and the substrate 502, sealing adhesive 503,liquid crystal 504, transparent electrodes 513 and 521, retardationfilms 505 and 507, and polarizers 506 and 508 are provided in a similarfashion to the first embodiment, a repeated description thereof will beomitted.

[0123] Unlike the configurations in the foregoing first to thirdembodiments in which the color filters are formed on the substrateshaving the reflective layers, in this embodiment, the substrate 501having a reflective layer 511 has no color filter formed thereon;instead, the substrate 502 opposing the substrate 501 has a color filter522 formed thereon.

[0124] The substrate 501 has the reflective layer 511 thereon havingapertures 511 a in the same manner as in the foregoing embodiments, thereflective layer 511 has a transparent insulating film 512 thereon, andthe insulating film 512 has the transparent electrodes 513 thereon.

[0125] On the other hand, the substrate 502 has coloring layers 522 r,522 g, and 522 b thereon. Each coloring layer has a hypochromic portion522 d (refer to FIG. 4(A) or 4(B)), mainly formed in the region whichdoes not two-dimensionally overlap the corresponding aperture 511 a, andhas a hyperchromic portion 522 c which is mainly formed in the regiontwo-dimensionally overlapping the corresponding aperture 511 a of theforegoing reflective layer 511 and which has a higher light density thanthe hypochromic portion 522 d. Moreover, the foregoing coloring layershave a stacked black matrix 522BM and an overcoat film 522 p thereon soas to form the color filter 522.

[0126] In this embodiment, since light traveling along the reflectingpath R passes through the hypochromic portion of the coloring layertwice and light traveling along the transmitting path T passes throughthe hyperchromic portion 522 c, the same optical effects and advantagesas in the first embodiment are obtained.

[0127] The electrooptical device substrate according to this embodimentis the substrate 502, and the substrate 502 has no reflective layerthereon, which is different from the foregoing embodiments. That is, theelectrooptical device substrate according to this embodiment is thesubstrate opposing the substrate 501 having the reflective layer. Insuch an electrooptical device substrate having no reflective layer, byforming the hyperchromic portion in a part of the coloring layerdisposed at each pixel, the perceived color characteristics of atransflective liquid crystal display panel can be improved.

[0128] Also, in this embodiment, as shown in FIG. 4(A), there is aregion which two-dimensionally overlaps the corresponding aperture 511 aand in which no hyperchromic portion 522 c is disposed; instead, thehypochromic portion 522 d is disposed in the region. In other words, apart of the hypochromic portion 522 d is disposed so as totwo-dimensionally overlap the corresponding aperture 511 a.

[0129] Alternatively, as shown in FIG. 4(B), there may be a region whichtwo-dimensionally overlaps the reflective layer 511 and in which nohypochromic portion 522 d is disposed; instead, the hyperchromic portion522 c may be disposed in the region. In other words, a part of thehyperchromic portion 522 c may be disposed so as to two-dimensionallyoverlap the reflective layer 511.

[0130] With the above-described configuration, the color of thetransmissive display or the reflective display can be easily tuned atlow cost in the same manner as in the first embodiment.

[0131] Although, in this embodiment, the color filter 522 having thesame structure as in the first embodiment is formed on the substrate 502which opposes the substrate 501 having the reflective layer 511 thereonthe color filter 522 may have a structure in which the hyperchromicportions are stacked on the hypochromic portions in a similar fashion tothe second embodiment, or the hypochromic portions are stacked on thehyperchromic portions in a similar fashion to the third embodiment.Also, in these cases, the color filter may be constructed in the samefashion as shown in FIG. 2(A) or 2(B) in the second embodiment, or inFIG. 3(A) or 3(B) in the third embodiment.

[0132] The configuration shown in FIG. 4(A) or 4(B) is realized in orderto achieve at least one color from a plurality of colors as required.Also, although both the hypochromic portion and the hyperchromic portionlie either above the corresponding aperture or on the reflective layerat each pixel in the foregoing configuration, both the hypochromicportion and the hyperchromic portion may lie together above thecorresponding aperture and on the reflective layer. In this case, thecolors of both the reflective display and the transmissive display canbe tuned.

[0133] Fifth Embodiment

[0134] Referring now to FIG. 5, an electrooptical device substrate andan electrooptical device according to a fifth embodiment of the presentinvention will be described. FIG. 5 is a schematic sectional viewillustrating the structure of a liquid crystal display panel 600according to this embodiment.

[0135] Since the liquid crystal display panel 600 has substrates 601 and602, sealing adhesive 603, liquid crystal 604, transparent electrodes613 and 621, retardation films 605 and 607, and polarizers 606 and 608in a similar fashion to the first embodiment, a repeated descriptionthereof will be omitted.

[0136] Also, the substrate 601 has a reflective layer 611 on the surfacethereof, having apertures 611 a and the reflective layer 611 has a colorfilter 612 thereon in a similar fashion to the first embodiment. In thisembodiment, the color filter 612 has hypochromic layers 612 r, 612 g,and 612 b having a uniform color density, a stacked black matrix 612BM,and an overcoat film 612 p.

[0137] On the other hand, the substrate 602 has hyperchromic layers 622r, 622 g, and 622 b formed thereon so that each of the hyperchromiclayers two-dimensionally overlaps the corresponding aperture 611 a ofthe reflective layer 611, and the hyperchromic layers 622 r, 622 g, and622 b have the transparent electrodes 621 formed thereon. Thehyperchromic layers 622 r, 622 g, and 622 b have a higher color densitythan the foregoing hypochromic layers 612 r, 612 g, and 612 b.

[0138] In this embodiment, while light traveling along the reflectingpath R mainly passes through the hypochromic layer on the substrate 601twice, light traveling along the transmitting path T mainly passesthrough the foregoing hypochromic layer and then further passes throughthe hyperchromic layer. Accordingly, when compared to the known liquidcrystal display panel having a structure shown in FIG. 11, the chroma ofthe transmissive display can be improved, and the difference in theperceived color between the reflective display and the transmissivedisplay can be reduced.

[0139] In this embodiment, as shown in FIG. 5(A), there is a region ateach pixel, which two-dimensionally overlaps the corresponding aperture611 a and in which, for example, no hyperchromic layer 622 g isdisposed; instead, only the hypochromic layer 612 g is disposed in theregion so as to two-dimensionally overlap the corresponding aperture 611a. Thus, there is a large region including the foregoing region at eachpixel, which two-dimensionally and exactly overlaps the correspondingaperture 611 a. Since this large region has two portions, one havingonly the hypochromic layer 612 g disposed therein and the other havingthe hyperchromic layer 622 g superposed on the hypochromic layer 612 g,the color of the transmissive display can be easily tuned by changingthe area of the hyperchromic layer 622 g.

[0140] Alternatively, as shown in FIG. 5(B), a part of the hyperchromiclayer 622 g may be disposed so as to two-dimensionally overlap thereflective layer 611. In this case, there is a region at each pixel,which two-dimensionally and exactly overlaps the reflective layer 611.Since this region has two portions, one having only the hypochromiclayer 612 g disposed therein and the other having the hyperchromic layer622 g superposed on the hypochromic layer 612 g, the color of thereflective display can be easily tuned by changing the area of thehyperchromic layer 622 g.

[0141] The foregoing structure is applicable to colors other than thecolor G in the same fashion as described above. Also, it is enough thatthe color filter 612 is constructed so as to have the foregoingstructure for at least one color among the plurality of colors.

[0142] Although, in this embodiment, each of the hypochromic layers onthe substrate 601 extends over the whole pixel and each of thehyperchromic layers on the substrate 602 is disposed so as totwo-dimensionally overlap the corresponding aperture 611 a of thereflective layer 611, alternatively the hypochromic layer on thesubstrate 601 may be disposed so as not to overlap the correspondingaperture 611 a of the reflective layer 611. In this case, the similaroptical structure as in the first embodiment can be obtained.

[0143] Although the hypochromic layers are formed on the substrate 601having the reflective layer 611 in this embodiment, on the contrary, thehyperchromic layers may be formed on the substrate having the reflectivelayer and the hypochromic layers may be formed on the other substrate.

[0144] Furthermore, although both the hypochromic portion and thehyperchromic portion lie either above the corresponding aperture or onthe reflective layer at each pixel in the configuration shown in FIG.1(A) or 1(B), both the hypochromic portion and the hyperchromic portionmay lie together above the corresponding aperture and on the reflectivelayer. In this case, the colors of both the reflective display and thetransmissive display can be tuned.

[0145] Sixth Embodiment

[0146] Referring now to FIG. 7, a method for fabricating anelectrooptical device substrate according to a sixth embodiment of thepresent invention will be described. The method for fabricating anelectrooptical device substrate relates to the fabrication of theelectrooptical device substrate used for the liquid crystal displaypanel 200 according to the first embodiment.

[0147] First, as shown in FIG. 7(a), the reflective layer 211 having theapertures 211 a is formed by forming a thin film, composed of a metalsuch as aluminum, an aluminum alloy, a silver alloy, or chrome, on thesurface of the substrate 201 by evaporation, sputtering, or the like,and then by patterning the thin film by a known photolithographictechnique.

[0148] Second, as shown in FIG. 7(b), the hypochromic portions 212 d ofthe coloring layers 212 r are formed on the patterned thin film byapplying a colored photosensitive resin (photosensitive resist) in whicha pigment, a dye, or the like for representing a predetermined hue isdispersed, and then by patterning it with a predetermined pattern byexposure and developing. Each of the hypochromic portions 212 d has apattern having a non-hypochromic region (an opening) above thecorresponding aperture 211 a of the foregoing reflective layer 211.Subsequently, as shown in FIG. 7(c), the hyperchromic portions 212 c areformed in the non-hypochromic regions of the hypochromic portions 212 dby applying a photosensitive resin containing a colorant, such as apigment or a dye, whose density is higher than the foregoing hypochromicportions, and then by patterning it in the same fashion as describedabove. In this step, the patterning is performed so as to form thehyperchromic portions 212 c in the spaces between the adjacent pixels.Thus, by repeating a similar step to that described above for thecoloring layers 212 g and 212 b having other hues, the coloring layers,each being used for the corresponding color and having the hyperchromicportion 212 c and the hypochromic portion 212 d, are sequentially formedas shown in FIG. 7(d). In this step, the stacked black matrix 212BMhaving a plurality of stacked coloring layers (three layers stacked inthe figure) is formed by patterning the coloring layers so as to overlapone after another in the spaces between the adjacent pixels. Since thestacked black matrix 212BM according to this embodiment is configured bystacking the hyperchromic portions 212 c, each having a different hue,as shown in FIG. 7(d), a high shielding effect can be achieved.

[0149] In the reverse order to the above-described forming order of thecoloring layers, first the hyperchromic portions 212 c and then thehypochromic portions may be formed. Also, for the coloring layers havingthe plurality of hues, the hypochromic portions may be sequentiallyformed first and then the hyperchromic portions may be sequentiallyformed, or inversely for the coloring layers having the plurality ofhues, the hyperchromic portions may be sequentially formed first andthen the hypochromic portions may be sequentially formed. Furthermore,instead of the foregoing stacked black matrix, a black light-shieldinglayer may be formed by disposing a black resin.

[0150] In the step of forming the foregoing coloring layers, a materialwhich can easily form a flat surface is used as a photosensitive resin.The material is applied by a method such as spin coating, which caneasily make a flat layer. Thus, the surface of each coloring layer ismade substantially flat in each pixel.

[0151] The electrooptical device substrate formed in the above-describedmanner has a substantially flat surface since the overcoat film 212 p(not shown) is formed. Subsequently, the liquid crystal display panel200 shown in FIG. 1 is fabricated by using the substrate 201 which isthe electrooptical device substrate.

[0152] When the liquid crystal display panel 200 shown in FIG. 1 is tobe fabricated, the color filter 212 formed on the foregoing substrate201 has a transparent conductor formed thereon by sputtering, and thenhas the transparent electrodes 213 formed by patterning the transparentconductor with a known photolithographic technique. Subsequently, thetransparent electrodes 213 have an alignment film thereon composed of apolyimide resin or the like, and then a rubbing treatment is applied tothe alignment film.

[0153] Then, the foregoing substrates 201 and 202 are bonded to eachother with the sealing adhesive 203 so as to form a panel structure. Inthis step, the substrate 202 has the transparent electrodes 221 and analignment film, which is similar to the foregoing alignment film, on thesurface thereof. The substrates 201 and 202 are bonded to each other soas to maintain a substantially fixed distance between these twosubstrates with spacers (not shown) dispersed between these substratesand other spacers mixed in the sealing adhesive 203.

[0154] Subsequently, the liquid crystal 204 is injected into the spacebetween the two substrates via an opening (not shown) of the sealingadhesive 203 and then the opening of the sealing adhesive 203 is closedwith sealant such as an ultraviolet curable resin. After completion ofthe main panel structure as described above, the foregoing retardationfilms 205 and 207, and the foregoing polarizers 206 and 208 are disposedon the surfaces of the substrates 201 and 202, respectively, by bondingor the like.

[0155] Seventh Embodiment

[0156] Referring now to FIG. 8, a method for fabricating anelectrooptical device substrate according to a seventh embodiment of thepresent invention will be described. This embodiment relates to a methodfor fabricating an electrooptical device substrate which corresponds tothe substrate 310 used for the liquid crystal display panel 300, shownin FIG. 2, according to the second embodiment.

[0157] First, in this embodiment, the reflective layer 311 having theapertures 311 a is formed on the substrate 301, as shown in FIG. 8(a).

[0158] Second, as shown in FIG. 8(b), the hypochromic portions 312 d forthe coloring layers 312 r are formed on the reflective layer 311. Thehypochromic portions 312 d are formed so as to cover the apertures 311 aof the reflective layer 311. In this step, the hypochromic portions 312d are also formed in the spaces between the adjacent pixels.

[0159] As shown in FIG. 8(c), the hyperchromic portions 312 c are thenformed on the foregoing hypochromic portions and just above theapertures 311 a of the reflective layer 311 so as to complete thecoloring layers 312 r having the hyperchromic portions 312 c partiallystacked on the corresponding hypochromic portions. Thus, by repeatingsuch a step for the coloring layers having other hues in a similarfashion as that described above, the coloring layers 312 r, 312 g, and312 b are formed as shown in FIG. 8(d). In this step, the stacked blackmatrix 312BM is also formed in a similar fashion to that describedabove. Although the stacked black matrix 312BM according to thisembodiment is formed by stacking the hypochromic portions 312 d havingdifferent colors from each other, it may be formed by stacking thehyperchromic portions in the same fashion as that in the sixthembodiment.

[0160] In this embodiment, although the coloring layers are sequentiallyformed for each color, the hypochromic portions for the plurality ofhues may be formed, followed by the hyperchromic portions for theplurality of hues.

[0161] By using the electrooptical device substrate according to thisembodiment, the liquid crystal display panel 300 shown in FIG. 2 isfabricated in the same fashion as that described in the sixthembodiment.

[0162] Other Embodiments

[0163] Referring now to FIG. 9, modifications of the electroopticaldevice substrates, the electrooptical devices, and the methods forfabricating electrooptical device substrates and electrooptical devicesaccording to the embodiments of the present invention will be described.In the foregoing embodiments, since the edge of the hyperchromic portionand the edge of the corresponding hypochromic portion are closely incontact with each other at each pixel (in the first embodiment), or oneof the hyperchromic portion and the corresponding hypochromic portioncompletely overlaps the other at each pixel (in the second and thirdembodiments), the reflective layer and the corresponding aperture arecompletely covered by at least one of the hyperchromic portion and thehypochromic portion. However, hyperchromic portions 212 c′ and 212″ andhypochromic portions 212 d′ and 212 d″ have a gap therebetween at eachpixel in example configurations shown in FIGS. 9(a) and 9(b),respectively, thereby providing a region which is not occupied by thecorresponding coloring layer. With these configurations, when the regionwhich is not occupied by the coloring layer is provided above anaperture 211 a′, as shown in FIG. 9(a), the transmissive display can bemade bright by making the color of the transmissive display faint. Also,when the region which is not occupied by the coloring layer is providedon a reflective layer 211″, as shown in FIG. 9(b), the reflectivedisplay can be made bright by making the color of the reflective displayfaint. Thus, the colors of the transmissive and reflective displays canbe tuned by changing the areas of the foregoing regions, in both cases,which are not occupied by the coloring layers. In particular, when sucha gap region is provided in the coloring layer, each of the colors ofthe transmissive and reflective displays can be tuned in the region(indicated by a corresponding broken line in FIG. 10) where the lightdensity is lower than that of the corresponding color of thehyperchromic portion, wherein the corresponding color is represented bythe square mark in the color chromaticity diagram in FIG. 10.

[0164] Also, FIGS. 9(c) and 9(d) illustrate other example configurationsin which hyperchromic portions 312 c′ and 312 c″ are stacked on theedges of hypochromic portions 312 d′ and 312 d″ at each pixel,respectively. With these configurations, when the hyperchromic portion312 c′ overlaps the hypochromic portion 312 d′ above an aperture 311 a′,as shown in FIG. 9(c), the chroma of the transmissive display can beimproved by making the color of the transmissive display dark. Inaddition, when the hyperchromic portion 312 c″ overlaps the hypochromicportion 312 d″ on a reflective layer 311″ at each pixel, as shown inFIG. 9(d), the chroma of the reflective display can be improved bymaking the color of the reflective display dark. Thus, the colors of thetransmissive and reflective displays can be tuned by changing the areasof the foregoing overlapped portions in both cases. In particular, whensuch an overlapped portion is provided in the coloring layer, each ofthe colors of the transmissive and reflective displays can be tuned inthe region (indicated by a corresponding broken line in FIG. 10) wherethe light density is higher than that of the corresponding color of thehyperchromic portion, wherein the corresponding color is represented bythe circled mark in the color chromaticity diagram in FIG. 10.

[0165] Furthermore, FIGS. 9(e) and 9(f) illustrate other examplestructures in which hypochromic portions 412 d′ and 412 d″ are stackedon the edges of hyperchromic portion 412 c′ and 412 c″ at each pixel,respectively. With these configurations, when the hypochromic portion412 d′ overlaps the hyperchromic portion 412 c′ above an aperture 411a′, as shown in FIG. 9(e), the chroma of the transmissive display can beimproved by making the color of the transmissive display dark. Also,when the hypochromic portion 412 d″ overlaps the hyperchromic portion412 c″ on the reflective layer 411″, as shown in FIG. 9(f), the chromaof the reflective display can be improved by making the color of thereflective display dark. Thus, the colors of the transmissive andreflective displays can be tuned by changing the foregoing overlappedareas in both cases. In particular, when such an overlapped portion isprovided in the coloring layer, each of the colors of the transmissiveand reflective displays can be tuned in the region (indicated by acorresponding broken line in FIG. 10) where the light density is higherthan that of the corresponding color of the hyperchromic portion,wherein the corresponding color is represented by the circled mark inthe color chromaticity diagram in FIG. 10.

[0166] The foregoing positional relationships between the hypochromicportions and the hyperchromic portions illustrated in FIGS. 9(a) to 9(f)are also applicable, with respect to the two-dimensional mutuallyoverlapping relationship, to the structure according to the fourthembodiment in which the reflective layer and the color filters areformed on the respective substrates, and to the other structureaccording to the fifth embodiment in which the hypochromic layers andthe hyperchromic layers are formed on the respective substrates. Moreparticularly, in the fourth and fifth embodiments, the hypochromicportion (hypochromic layer) and the hyperchromic portion (hyperchromiclayer) may have a gap two-dimensionally formed therebetween, as shown inFIGS. 9(a) and 9(b), and a part of the hypochromic portion (hypochromiclayer) may two-dimensionally overlap another part of the hyperchromicportion (hyperchromic layer), as shown in FIGS. 9(c) to 9(f).

[0167] The present invention is not limited the electrooptical devicesubstrates, the electrooptical devices, the methods for fabricating theelectrooptical device substrates and the electrooptical devices in theexamples illustrated by the foregoing figures; those skilled in the artwill appreciate that various modifications can be made without departingfrom the spirit of the present invention.

[0168] Although a passive-matrix liquid crystal display panel isexemplified in all the above-described embodiments, for example, theelectrooptical device according to the present invention is alsoapplicable to an active-matrix liquid crystal display panel (e.g., aliquid crystal display panel having TFTs (thin film transistors) or TFDs(thin film diodes) as switching elements). Other than the liquid crystaldisplay panel, the present invention is also applicable to a variety ofelectrooptical devices in which the display state of a plurality ofpixels is controllable, such as an electroluminescent device, an organicelectroluminescent device, an inorganic electroluminescent device, anFED (field emission display) device, an LED (light emitting diode)display device, a plasma display device, an electrophoretic displaydevice, a thin cathode ray tube, a small TV using a liquid crystalshutter or the like, and an apparatus using a digital micro-mirrordevice (DMD).

[0169] Electronic Apparatus Embodiments

[0170] Last, an electronic apparatus according to an electronicapparatus embodiment will be described wherein the electronic apparatususes a liquid crystal device, including the foregoing liquid crystaldisplay panel, as a display device. FIG. 12 is a schematic block diagramillustrating the overall configuration of this embodiment. An electronicapparatus shown in this drawing has the liquid crystal display panel200, the same as described above, and control means 1200 for controllingit. In the drawing, the liquid crystal display panel 200 is conceptuallyillustrated so as to have a panel structure 200A and a drive circuit200B including a semiconductor IC and so forth. The control means 1200includes a display-information output source 1210, a display processcircuit 1220, a power circuit 1230, and a timing generator 1240.

[0171] The display-information output source 1210 has a memory such as aROM (read only memory) and a RAM (random access memory), a storage unitincluding a magnetic storage disk, an optical storage disk, and soforth, and a tuning circuit for outputting a tuned digital image signal,and sends display information in the form of an image signal and thelike with a predetermined format to the display-information processcircuit 1220 in response to a variety of clock signals generated by thetiming generator 1240.

[0172] The display-information process circuit 1220 has a variety ofknown circuits such as a serial-parallel conversion circuit, anamplification and reversion circuit, a rotation circuit, a gammacorrection circuit, and a clamp circuit, processes the input displayinformation, and sends the processed image information together with aclock signal CLK to the drive circuit 200B. The drive circuit 200Bincludes a scan line drive circuit, a data line drive circuit, and atesting circuit. The power circuit 1230 feeds a predetermined voltage toeach of the above described components.

[0173]FIG. 13 illustrates a portable phone as an example of theelectronic apparatus according to this embodiment of the presentinvention. A portable phone 2000 is constructed such that a casing 2010has a circuit board 2001 disposed therein and the circuit board 2001 hasthe foregoing liquid crystal display panel 200 mounted thereon. Thecasing 2010 has an array of operation buttons 2020 on the front surfacethereof and an antenna 2030 retractably attached at one end thereof. Areceiver 2040 has a speaker disposed therein and a transmitter 2050 hasa built-in microphone therein.

[0174] The display surface of the liquid crystal display panel 200installed in the casing 2010 is visible through a display window 2060.

[0175] The electronic apparatus according to the present invention isnot limited to the foregoing examples illustrated in the drawings, butthose skilled in the art will appreciate that various modifications canbe made without departing from the spirit of the present invention.Other than the foregoing examples, the present invention relates toelectronic apparatuses including a digital watch, a digital stillcamera, a touch panel, an electronic calculator, a TV, a projector,video tape recorders of viewfinder type and monitor direct view type, anautomobile navigation system, a pager, an electronic notebook, a wordprocessor, a workstation, a videophone, a POS terminal. Theelectrooptical device according to the present invention can be used asa display of these electronic apparatuses.

[0176] Advantages

[0177] As described above, according to the present invention, the colorof the transmissive display or the reflective display can be easilytuned at low cost. Also, the difference in the perceived color betweenthe reflective display and the transmissive display can be reduced, and,in particular, the chroma of the transmissive display can be improved.

[0178] The entire disclosure of Japanese Patent Application Nos.2001-296480 filed Sep. 27, 2001 and 2002-217915 filed Jul. 26, 2002 areincorporated by reference herein.

What is claimed is:
 1. An electrooptical device substrate for formingcoloring layers thereon, each comprising a hypochromic portion and ahyperchromic portion having a higher light density than the hypochromicportion, and for forming a reflective layer, including apertures,thereon, wherein the hypochromic portion is disposed on the reflectivelayer and the hyperchromic portion is disposed above a correspondingaperture, and wherein there is a region in which no hyperchromic portionis disposed above a part of the corresponding aperture.
 2. Theelectrooptical device substrate according to claim 1, wherein thehypochromic portion is disposed in at least one part of the region. 3.An electrooptical device substrate for forming coloring layers thereon,each comprising a hypochromic portion and a hyperchromic portion havinga higher light density than the hypochromic portion, and for forming areflective layer, including apertures, thereon, wherein the hypochromicportion is disposed on the reflective layer and the hyperchromic portionis disposed above a corresponding aperture, and wherein a part of thehypochromic portion is also disposed above the corresponding aperture.4. An electrooptical device substrate for forming coloring layersthereon, each comprising a hypochromic portion and a hyperchromicportion having a higher light density than the hypochromic portion, andfor forming a reflective layer, including apertures, thereon, whereinthe hyperchromic portion is disposed above a corresponding aperture andthe hypochromic portion is disposed on the reflective layer, and whereinthere is a region in which no hypochromic portion is disposed on a partof the reflective layer.
 5. The electrooptical device substrateaccording to claim 4, wherein the hyperchromic portion is disposed in atleast one part of the region.
 6. The electrooptical device substrate forforming coloring layers thereon, each comprising a hypochromic portionand a hyperchromic portion having a higher light density than thehypochromic portion, and for forming a reflective layer, includingapertures, thereon, wherein the hyperchromic portion is disposed above acorresponding aperture and the hypochromic portion is disposed on thereflective layer, and wherein a part of the hyperchromic portion is alsodisposed on the reflective layer.
 7. The electrooptical device substrateaccording to claim 1, wherein at least one part of the hypochromicportion overlaps at least one part of the hyperchromic portion.
 8. Anelectrooptical device comprising: an electrooptical layer comprising anelectrooptical material; a substrate lying along the electroopticallayer; a reflective layer which includes apertures and which is disposedon the substrate; and coloring layers disposed on the substrate, eachcoloring layer comprising a hypochromic portion and a hyperchromicportion having a higher light density than the hypochromic portion,wherein the hypochromic portion is disposed on the reflective layer andthe hyperchromic portion is disposed above a corresponding aperture, andwherein there is a region in which no hyperchromic portion is disposedabove a part of the corresponding aperture.
 9. The electrooptical deviceaccording to claim 8, wherein the hypochromic portion is disposed in atleast one part of the region.
 10. An electrooptical device comprising: asubstrate; coloring layers disposed on the substrate, each coloringlayer comprising a hypochromic portion and a hyperchromic portion havinga higher light density than the hypochromic portion; and a reflectivelayer which includes apertures and which is disposed on the substrate,wherein the hypochromic portion is disposed on the reflective layer andthe hyperchromic portion is disposed above a corresponding aperture, andwherein a part of the hypochromic portion is also disposed above thecorresponding aperture.
 11. An electrooptical device comprising: anelectrooptical layer comprising an electrooptical material; a substratelying along the electrooptical layer; a reflective layer which includesapertures and which is disposed on the substrate; and coloring layersdisposed on the substrate, each coloring layer comprising a hypochromicportion and a hyperchromic portion having a higher light density thanthe hypochromic portion, wherein the hypochromic portion is disposed onthe reflective layer and the hyperchromic portion is disposed above acorresponding aperture, and wherein there is a region in which nohypochromic portion is disposed on a part of the reflective layer. 12.The electrooptical device according to claim 11, wherein thehyperchromic portion is disposed in at least one part of the region. 13.An electrooptical device comprising: a substrate; coloring layersdisposed on the substrate, each coloring layer comprising a hypochromicportion and a hyperchromic portion having a higher light density thanthe hypochromic portion; and a reflective layer which includes aperturesand which is disposed on the substrate, wherein the hypochromic portionis disposed on the reflective layer and the hyperchromic portion isdisposed above a corresponding aperture, and wherein a part of thehyperchromic portion is also disposed on the reflective layer.
 14. Theelectrooptical device according to claim 8, wherein at least one part ofthe hypochromic portion overlaps at least one part of the hyperchromicportion.
 15. An electrooptical device comprising: an electroopticallayer comprising an electrooptical material; a substrate lying along theelectrooptical layer; a reflective layer which includes apertures andwhich is disposed on the substrate; a counter substrate disposed so asto oppose the substrate; and coloring layers disposed on the countersubstrate, each coloring layer comprising a hypochromic portion and ahyperchromic portion having a higher light density than the hypochromicportion, wherein the hypochromic portion is disposed so as totwo-dimensionally overlap the reflective layer and the hyperchromicportion is disposed so as to two-dimensionally overlap a correspondingaperture, and wherein there is a region which two-dimensionally overlapsa part of the corresponding aperture and in which no hyperchromicportion is disposed.
 16. The electrooptical device according to claim15, wherein the hypochromic portion is also disposed in at least onepart of the region.
 17. An electrooptical device comprising: asubstrate; coloring layers disposed on the substrate, each coloringlayer comprising a hypochromic portion and a hyperchromic portion havinga higher light density than the hypochromic portion; and a reflectivelayer which includes apertures and which is disposed on the substrate,wherein the hypochromic portion is disposed on the reflective layer andthe hyperchromic portion is disposed above a corresponding aperture, andwherein a part of the hypochromic portion is disposed so as totwo-dimensionally overlap the corresponding aperture.
 18. Anelectrooptical device comprising: an electrooptical layer comprising anelectrooptical material; a substrate lying along the electroopticallayer; a reflective layer which includes apertures and which is disposedon the substrate; a counter substrate disposed so as to oppose thesubstrate; and coloring layers disposed on the counter substrate, eachcoloring layer comprising a hypochromic portion and a hyperchromicportion having a higher light density than the hypochromic portion,wherein the hypochromic portion is disposed so as to two-dimensionallyoverlap the reflective layer, and the hyperchromic portion is disposedso as to two-dimensionally overlap a corresponding aperture, and whereinthere is a region which two-dimensionally overlaps a part of thereflective layer and in which no hypochromic portion is disposed. 19.The electrooptical device according to claim 18, wherein thehyperchromic portion is also disposed in at least one part of theregion.
 20. An electrooptical device comprising: an electrooptical layercomprising an electrooptical material; a substrate lying along theelectrooptical layer; a reflective layer which includes apertures andwhich is disposed on the substrate; a counter substrate disposed so asto oppose the substrate; and coloring layers disposed on the countersubstrate, each coloring layer comprising a hypochromic portion and ahyperchromic portion having a higher light density than the hypochromicportion, wherein the hypochromic portion is disposed so as totwo-dimensionally overlap the reflective layer and the hyperchromicportion is disposed so as to two-dimensionally overlap a correspondingaperture, and wherein a part of the hyperchromic portion is alsodisposed so as to two-dimensionally overlap the reflective layer. 21.The electrooptical device according to claim 15, wherein at least onepart of the hypochromic portion two-dimensionally overlaps at least onepart of the hyperchromic portion.
 22. An electrooptical devicecomprising: a pair of substrates; an electrooptical layer whichcomprises an electrooptical material and which is held between the pairof substrates; a reflective layer which includes apertures and which isdisposed between the pair of substrates; a hypochromic layer disposed ateach pixel on one of the pair of substrates lying along theelectrooptical layer; and a hyperchromic layer which is disposed at eachpixel on the other of the pair of substrates and which has a higherlight density than the hypochromic layer, wherein the hypochromic layeris disposed so as to two-dimensionally overlap the reflective layer andthe hyperchromic layer is disposed so as to two-dimensionally overlap acorresponding aperture, and wherein there is a region whichtwo-dimensionally overlaps a part of the corresponding aperture and inwhich no hyperchromic layer is disposed.
 23. The electrooptical deviceaccording to claim 22, wherein the hypochromic layer is also disposed soas to overlap at least one part of the region.
 24. An electroopticaldevice comprising: a pair of substrates; an electrooptical layer whichcomprises an electrooptical material and which is held between the pairof substrates; a reflective layer which includes apertures and which isdisposed between the pair of substrates; i a hypochromic layer disposedat each pixel on one of the pair of substrates lying along theelectrooptical layer; and a hyperchromic layer which is disposed at eachpixel on the other of the pair of substrates and which has a higherlight density than the hypochromic layer, wherein the hypochromic layeris disposed so as to two-dimensionally overlap the reflective layer andthe hyperchromic layer is disposed so as to two-dimensionally overlap acorresponding aperture, and wherein a part of the hypochromic layer isalso disposed so as to two-dimensionally overlap the correspondingaperture.
 25. An electrooptical device comprising: a pair of substrates;an electrooptical layer which comprises an electrooptical material andwhich is held between the pair of substrates; a reflective layer whichincludes apertures and which is disposed between the pair of substrates;a hypochromic layer disposed at each pixel on one of the pair ofsubstrates lying along the electrooptical layer; and a hyperchromiclayer which is disposed at each pixel on the other of the pair ofsubstrates and which has a higher light density than the hypochromiclayer, wherein the hypochromic layer is disposed so as totwo-dimensionally overlap the reflective layer and the hyperchromiclayer is disposed so as to two-dimensionally overlap a correspondingaperture, and wherein there is a region which two-dimensionally overlapsa part of the reflective layer and in which no hypochromic layer isdisposed.
 26. The electrooptical device according to claim 25, whereinthe hyperchromic layer is also disposed so as to overlap at least onepart of the region.
 27. An electrooptical device comprising: a pair ofsubstrates; an electrooptical layer which comprises an electroopticalmaterial and which is held between the pair of substrates; a reflectivelayer which includes apertures and which is disposed between the pair ofsubstrates; a hypochromic layer disposed at each pixel on one of thepair of substrates lying along the electrooptical layer; and ahyperchromic layer which is disposed at each pixel on the other of thepair of substrates and which has a higher light density than thehypochromic layer, wherein the hypochromic layer is disposed so as totwo-dimensionally overlap the reflective layer and the hyperchromiclayer is disposed so as to two-dimensionally overlap a correspondingaperture, and wherein a part of the hyperchromic layer is also disposedso as to two-dimensionally overlap the reflective layer.
 28. Theelectrooptical device according to claim 22, wherein at least one partof the hypochromic layer two-dimensionally overlaps at least one part ofthe hyperchromic layer.
 29. A method for fabricating an electroopticaldevice substrate, comprising the steps of: forming coloring layers on asubstrate, each coloring layer comprising a hypochromic portion and ahyperchromic portion having a higher light density than the hypochromicportion; and forming a reflective layer, including apertures, on thesubstrate, wherein, in the step of forming the coloring layers, thehyperchromic portion is formed so as to two-dimensionally overlap acorresponding aperture, the hypochromic portion is formed so as totwo-dimensionally overlap the reflective layer, and a region whichtwo-dimensionally overlaps a part of the corresponding aperture and inwhich no hyperchromic portion is disposed is formed.
 30. A method forfabricating an electrooptical device, comprising the steps of: formingcoloring layers on a substrate, each coloring layer comprising ahypochromic portion and a hyperchromic portion having a higher lightdensity than the hypochromic portion; and forming a reflective layer,including apertures, on the substrate or on a counter substrate whichopposes the substrate, wherein, in the step of forming the coloringlayers, the hyperchromic portion is formed so as to two-dimensionallyoverlap a corresponding aperture, the hypochromic portion is formed soas to two-dimensionally overlap the reflective layer, and a region whichtwo-dimensionally overlaps the corresponding aperture and in which nohyperchromic portion is disposed is formed.
 31. A method for tuning thecolor of a color filter, wherein, when a hypochromic portion and ahyperchromic portion having a higher light density than the hypochromicportion are provided in each coloring region which is disposed in asubstantially identical optical state in the color filter, the color ofthe coloring region is tuned by changing at least one of the areas ofthe hypochromic portion and the hyperchromic portion in the coloringregion.
 32. An electronic apparatus comprising the electrooptical deviceaccording to claim 8.